METHOD FOR MANUFACTURING SHALLOW TRENCH ISOLATION STRUCTURE

摘要

PURPOSE: A method for manufacturing a shallow trench isolation structure is provided to relax a corner effect by forming a liner oxide layer using an ozone gas. CONSTITUTION: A substrate(100) is provided. A pad oxide layer is formed on the substrate(100). A hard mask is formed on the substrate(100). A trench is formed within the substrate(100) by etching the hard mask, the pad oxide layer, and the substrate(100). A ultraviolet ray is irradiated to the substrate(100) under ozone atmosphere. A liner oxide layer(108) is formed on a surface of the trench by irradiating the ultraviolet ray. The trench is filled with an insulating plug(110a).