Vorrichtung zum Detektieren des Oberflächenzustandes eines Wafers

摘要

An apparatus for detecting a surface condition of a wafer can be incorporated in a wafer production system. The apparatus has a laser beam source for emitting a laser beam having a wavelength for transmission through the wafer. The laser beam source is positioned to apply the laser beam to the wafer from a reverse side thereof such that the laser beam undergoes total reflection from a surface of the wafer for thereby producing near-field leakage light on the surface of the wafer. Scattered light generated by the near-field leakage light is observed to detect a surface condition of the wafer. A method of detecting a surface condition of a wafer is also disclosed.