| 摘要 |
PURPOSE: A horizontal high current density electroplating cell is provided to quality and actual yield of plated steel by minimizing surface defects caused by flow rate nonuniformity of a plating solution occurred in an existing horizontal high current density electroplating cell. CONSTITUTION: A horizontal high current density electroplating cell comprises conductor rolls (10), a plating solution ejector (20), plating solution channels (30), and a plurality of insoluble anodes (40), wherein a plating solution is ejected into the plating solution channel in the same direction as the transfer direction of a steel plate (50) through the plating solution ejector (20) as transferring the steel plate (50) in one direction through conductor rolls (10) so that metal ions are electrodeposited on the steel plate (50). Each inclined dams are installed on upper and lower parts of the plating solution channel between the insoluble anodes (40) and the plating solution ejector (20). The dams are installed at positions of 1/3 to 1/2 of a distance between nozzle outlet of the plating solution ejector (20) and center of the insoluble anodes (40) based on the nozzle outlet. The dams are formed in a trapezoid shape.
|
