发明名称 |
Method and apparatus for cleaning a vacuum line in a CVD system |
摘要 |
An apparatus for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor processing device. The apparatus uses RF energy to form excite the constituents of particulate matter exhausted from a semiconductor processing chamber into a plasma state such that the constituents react to form gaseous products that may be pumped through the vacuum line. The apparatus may include a collection chamber structured and arranged to collect particulate matter flowing through the apparatus and inhibiting egress of the particulate matter from the apparatus. The apparatus may further include an electrostatic collector to enhance particle collection in the collection chamber and to further inhibit egress of the particulate matter.
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申请公布号 |
US6194628(B1) |
申请公布日期 |
2001.02.27 |
申请号 |
US19950533174 |
申请日期 |
1995.09.25 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
PANG BEN;CHEUNG DAVID;TAYLOR, JR. WILLIAM N.;RAOUX SEBASTIEN;FODOR MARK |
分类号 |
B01J19/24;C23C16/44;C23C16/50;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):B09B3/00 |
主分类号 |
B01J19/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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