发明名称 DEVELOPING DEVICE AND DEVELOPING METHOD
摘要 PROBLEM TO BE SOLVED: To enhance a developing efficiency and stabilize quality at the developing process of an LCD manufacturing process, and also, to attain the reduction of costs by simplifying the structure of a developing device. SOLUTION: The developing device is provided with at least a dip tank 2 having a circular periphery, proximity pins 5 for holding a substrate at nearly the center of the dip tank, substrate-drift checking pins 4 and plural nozzle units 6 with plural nozzles for uniformly jetting a chemical liquid in a circumferential direction, an overflow tank 1 for collecting and discharging the chemical liquid overflowing the dip tank, and a uniform rotating stream is generated by the chemical liquid uniformly jetted from the nozzles, and then, developing is executed while supplying the fresh chemical liquid to the surface of a substrate to be processed 3 in a stable state.
申请公布号 JP2001056571(A) 申请公布日期 2001.02.27
申请号 JP19990233565 申请日期 1999.08.20
申请人 NEC CORP 发明人 MORIO KENJI
分类号 H01L21/027;G03F7/30;(IPC1-7):G03F7/30 主分类号 H01L21/027
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