发明名称 OPTICAL SYSTEM ELEMENT, ASTIGMATISM COMPENSATOR, CHARGED PARTICLE BEAM EXPOSURE SYSTEM AND MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electrostatic type astigmatism compensator where aberrations due to a higher-order component, such as a 6θcomponent and a 10θcomponent will not be produced, even when a large astigmatism compensating output is outputted. SOLUTION: In this astigmatism compensator, electrodes 1A, 1B, 1C, 1D, 1E, 1F, 1G, 1H, 1I, 1J, 1K, 1L, 1M, 1N, 1O, 1P are formed in a 16 fold symmetrical form with respect to an optical axis. By defining voltages applied to respective electrodes 1A, 1B,..., 1P as VA, VB,..., VP, respectively, voltages Vx, Vy are applied from two power sources, so as to satisfy VA:VB:VC:VD:VE:VF: VG:VH:VI:VJ:VK:VL:VM:VN:VO:VP=+Vx:+(Vx+Vy)/21/2:+ Vy:-(Vx-Vy)/21/2:-Vx:-(Vx+Vy)/21/2:-Vy:+(Vx-Vy)/21/2:+Vx:+(Vx+ Vy)/21/2:+Vy:-(Vx-Vy)/21/2:-Vx:-(Vx+Vy)/21/2:-Vy:+(Vx-Vy)/21/2.
申请公布号 JP2001057169(A) 申请公布日期 2001.02.27
申请号 JP19990230302 申请日期 1999.08.17
申请人 NIKON CORP 发明人 SHIMIZU HIROYASU
分类号 H01J37/153;G03F7/20;H01J37/305;H01L21/027;(IPC1-7):H01J37/153 主分类号 H01J37/153
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