发明名称 |
Printing sublithographic images using a shadow mandrel and off-axis exposure |
摘要 |
The present invention overcomes the limitations of the prior art to allow for the creation of smaller components for use in logic circuits. The invention provides a new method of defining and forming features on a semiconductor substrate by using a layer of material, referred to as a shadow mandrel layer, to cast a shadow. A trough is etched in the shadow mandrel layer. At least one side of the trough will be used to cast a shadow in the bottom of the trough. A conformally deposited photoresist is used to capture the image of the shadow. The image of the shadow is used to define and form a feature. This allows for the creation of images on the surface of a wafer without the diffraction effects encountered in conventional photolithography. This allows for a reduced device size and increased chip operating speed.
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申请公布号 |
US6194268(B1) |
申请公布日期 |
2001.02.27 |
申请号 |
US19980183926 |
申请日期 |
1998.10.30 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
FURUKAWA TOSHIHARU;HAKEY MARK C.;HOLMES STEVEN J.;HORAK DAVID V.;RABIDOUX PAUL A. |
分类号 |
G03F7/00;G03F7/20;H01L21/027;H01L21/033;H01L21/28;H01L21/311;H01L21/768;(IPC1-7):H01L21/336 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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