发明名称 ABRASIVE MATERIAL LAYER STRUCTURE OF HARD RAW MATERIAL
摘要 PROBLEM TO BE SOLVED: To suppress the effect of the uneven surface of a surface layer, by improving the smoothness of the surface, as well as arranging an abrasive material densely continuously on the surface, in a hard raw material used as the material of a tool or the like. SOLUTION: Adjacent abrasive materials 2 are arranged in one layer in contact with one another on the surface of a base material 1, and wax materials 3 are filled in the clearances of the abrasive materials 2, so as to form an abrasive material layer, and the surface of the abrasive material layer is cut in a uniform even surface. As a result, the surface of the abrasive material layer is mostly occupied by the abrasive material, so as to be high in wear resistance and furthermore, a hard raw material of an even surface can be obtained.
申请公布号 JP2001054868(A) 申请公布日期 2001.02.27
申请号 JP19990233893 申请日期 1999.08.20
申请人 NORITAKE DIAMOND IND CO LTD;NORITAKE CO LTD 发明人 TOGE NAOKI;NONOSHITA TETSUYA
分类号 B24D3/00;B24D3/02;B24D3/06;(IPC1-7):B24D3/00 主分类号 B24D3/00
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