发明名称 |
Scanning type exposure device having individually adjustable optical modules and method of manufacturing same |
摘要 |
Scanning type exposure device that includes a projection optical system having a plurality of projection optical system modules configured to facilitate projection exposure of a pattern onto a photosensitive substrate based on a mask. The projection optical system modules are configured to be individually adjusted based on a displacement characteristic related to the mask. Also disclosed are methods of manufacturing and using the scanning type exposure device.
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申请公布号 |
US6195153(B1) |
申请公布日期 |
2001.02.27 |
申请号 |
US19990316768 |
申请日期 |
1999.05.21 |
申请人 |
NIKON CORPORATION |
发明人 |
SHIMIZU KENJI |
分类号 |
H01L21/027;G03B27/52;G03F7/20;(IPC1-7):G03B27/42;G03B27/54 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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