METHOD AND DEVICE FOR DEVELOPMENT PROCESSING

摘要

PROBLEM TO BE SOLVED: To lessen variations in the development processing of a pattern and to enhance the uniformity of the line width of the pattern. SOLUTION: While a developer L is made to discharge from a developer feeding nozzle 86 in a strip shape, the nozzle 86 is made to scan on a substrate W, whereby the developer L is applied on the substrate W subsequent to an exposure of the substrate to perform a development processing on the substrate W. The nozzle 86 discharges the developer L on the substrate W in such a way as to scan on the substrate W more than two times to coat the developer L on the substrate W.