发明名称 ETCHING DEVICE OF SHADOW MASK MATERIAL, AND SHADOW MASK
摘要 PROBLEM TO BE SOLVED: To provide an etching device of a shadow mask material, capable of improving the mechanical strength of the shadow mask and to provide a shadow mask having high mechanical strength. SOLUTION: In this shadow mask, while plural feeding pipes 11 are rocked to center their center axes by a rocking mechanism 20, an etching solution is fed from a spray nozzle 12 of each of the plural feeding pipes 11 toward the large-hole side surface (lower surface) of a shadow mask material W. The feeding direction of the etching solution in feeding pipes 111, 117 on both end parts in the width direction of the shadow mask material W is always set so as to be oriented toward the outside the widthwise direction of the shadow mask material W.
申请公布号 JP2001057150(A) 申请公布日期 2001.02.27
申请号 JP19990230244 申请日期 1999.08.17
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NISHIKUBO HIROAKI
分类号 H01J9/14;C23F1/00;C23F1/08;H01J29/07;(IPC1-7):H01J9/14 主分类号 H01J9/14
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