发明名称 LITHOGRAPHIC PROJECTION APPARATUS, AND MANUFACTURE OF DEVICE BY USING THE APPARATUS
摘要 PURPOSE: An object-mounting table is moved in a vacuum chamber through a means present in its outside by providing a positioning means for moving a sliding seal, to move thereby the object mounting table in the vacuum chamber. CONSTITUTION: A vacuum chamber V is surrounded by walls (11) defining openings (11a) provided in its floor. The vacuum chamber V is kept at a sufficient vacuous level by a proper type of vacuum pump. The openings (11a) are sealed with a sliding seal formed out of a sliding seal plate (12), and a wafer support pillar (13) is provided in the intermediate of the sliding seal plate (12). The pillar (13) supports a fine stage, i.e., a short-stroke wafer support chuck (14) for carrying the wafer W. A long-stroke motion, whereby the wafer W is positioned below the lens of a lithographic projection apparatus for exposing to a light the various regions of the wafer W, is achieved by causing the whole of the sliding seal plate (12) to move.
申请公布号 KR20010014745(A) 申请公布日期 2001.02.26
申请号 KR20000020026 申请日期 2000.04.17
申请人 ASM LITHOGRAPHY B.V. 发明人 BISSCHOPS THEODORUS HUBERTUS J;VIJFVINKEL JAKOB;SOEMERS HERMANUS MATHIAS J R;DRIESSEN JOHANNES CORNELIS;RENKENS MICHAEL JOZEFA MATHIJS;BOUWER ADRIANUS GERARDUS
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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