发明名称 |
SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING SYSTEM, AND METHOD FOR THE SAME |
摘要 |
PURPOSE: A substrate cleaning device, a substrate cleaning system, and a method for the same are provided to protect a substrate from a friction or a scratch and clean efficiently the substrate by maintaining an initial contact pressure. CONSTITUTION: A core material(68) for supplying pure water from a pure water supply path(60) is installed at a head(66) of a cleaning device(24). A plane portion(72) is formed at a lower portion of the core material(68). An outer face of the core material(68) is coated by a porous resin sheet(69). A rod(31) presses the cleaning device(24) to a substrate. An air bearing cylinder(30) is installed to transmit power to the rod(31). The pure water supply path(60) is formed inside the rod(31). The pure water supplied from the pure water supply path(60) is passed through the core material(68) and the porous resin sheet(69). A floating layer of the pure water is formed between the head(66) and the substrate.
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申请公布号 |
KR20010015426(A) |
申请公布日期 |
2001.02.26 |
申请号 |
KR20000042704 |
申请日期 |
2000.07.25 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HIROSE GEIJO;SEKIGUCHI GENJI;INOUE TOMOHIDE;MIYAJAKI DAKANORI;UENO GINYA |
分类号 |
H01L21/304;B08B1/04;B08B3/04;H01L21/00;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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