| 摘要 |
PURPOSE: A method of manufacturing an integrated circuit capacitor having a tapered plug is provided to increase the capacity of the capacitor without reducing reliability of the capacitor. CONSTITUTION: In the method of manufacturing the integrated circuit capacitor, an interconnection line(26) is formed over a substrate(24). Next, a first dielectric layer(28) is deposited on the line(26), and a through hole(increases toward the direction of the substrate and has a width of a tapered form) is etched in the layer(28). then, a conductive metal layer is filled in the through hole for forming a metallic plug(32) in the layer(28). And, a trench(30) is etched in the layer(28) on the periphery of the upper part of the plug(32), and a second dielectric layer(38) is deposited on a lower electric layer(36), in close proximity to the plug(32). Finally, an upper electrode layer(40) is deposited on the layer(28).
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