| 摘要 |
PURPOSE: An automatic classification apparatus of surface defects is provided to automatically classify a defect on the surface of a semiconductor wafer into one of a predetermined number of core classes using a core classifier employing boundary and topographical information. CONSTITUTION: In a method for automatically classifying surface defects, the defect is then further classified into a subclass of arbitrarily defined defects defined by the user with a specific adaptive classifier associated with the one core class and trained to classify defects only from a limited number of related core classes. The defects that cannot be classified by the core classifier or the specific adaptive classifiers are classified by a full classifier.
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