| 摘要 |
PURPOSE: A method and a system for multiband UV lighting of wafer for optical microscope wafer inspection and measurement system are provided to actualize the lighting of multiband UV which is technically adaptive to various applications, advantageous in cost, and hardly broken. CONSTITUTION: The system comprises a UV light source (such as Hg arc lamp) to generate a multiband UV light source having two UV narrow bands of 360-370nm and 398-407nm and a single visual narrow band of 427-434nm through broadband and discontinuous band filtering treatment. The optical microscope is characterized by a broadband objective system, a lighting path, and a tube lens, a camera, and a data processor. |
