APPARATUS AND METHOD FOR THERMALLY PROCESSING SUBSTRATE INCLUDING PROCESSOR USING MULTIPLE DETECTION SIGNALS

摘要

PURPOSE: An apparatus for thermally processing a substrate is provided to precisely measure temperature of the substrate by thermally processing the substrate inside a processing chamber with a radiation source for heating the substrate. CONSTITUTION: In one aspect, a detection system is configured to receive radiation from the substrate and to produce first and second detection system signals respectively representative of different first and second spectral portions of the received radiation. A processor is coupled to the detection system and configured to compute a measure of substrate temperature based upon the second detection system signal and to compute an indication of the relative accuracy of the computed measure of substrate temperature based upon the first detection system signal. In another aspect, the substrate is radiatively heated, radiation is received from the substrate and an intensity signal representative of the intensity of the received radiation is produced. An indication of the rate at which the substrate is being heated is computed based upon the intensity signal and when the substrate is placed onto a substrate support inside the processing chamber is controlled based upon the computed heating rate indication.