发明名称 METHOD FOR MANUFACTURING BUILT-UP MULTI-LAYER SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To prevent the dissolution of any copper plated film in manufacturing a built-up multi-layer substrate. SOLUTION: In a process for operating copper plating being a process for manufacturing a built-up multi-layer substrate, the crystal orientation property of a copper plated film 102 is controlled. That is, the crystal orientation property of the copper plated film 102 is controlled so that the rate of X-ray pattern diffraction strength I(111) of the (111) face of the copper plated film 102 to X-ray pattern diffraction strength I(220) of the (220) face of the copper plated film 102 can be set as I(220)/I(111)<0.2. Thus, in a process for roughening a resin surface 104 of the substrate by chrome acid, a copper plated film which is difficult to corrode can be formed.
申请公布号 JP2001053439(A) 申请公布日期 2001.02.23
申请号 JP19990224148 申请日期 1999.08.06
申请人 SUMITOMO METAL ELECTRONICS DEVICES INC 发明人 HAMANO AKIHIRO
分类号 H05K3/38;H01L23/12;H05K3/46;(IPC1-7):H05K3/46 主分类号 H05K3/38
代理机构 代理人
主权项
地址