| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography system in which an optimum process parameter can be set and a method for its operation. SOLUTION: When a semiconductor wafer is loaded in a spinner 110, a first controller 120 sets an optimum process parameter according to the inputted information on the semiconductor wafer, and controls the spinner 110 according to the set process parameter. When the semiconductor wafer coated with a photo resist film is loaded in a stepper 140, a second controller 150 sets an optimum process parameter based on the inputted information on the semiconductor wafer and controls the stepper 140 according to the set process parameter. Thus, the first and the second controller determine optimum process parameters for a semiconductor wafer based on the inputted wafer information, and a lithography process is executed under the optimum conditions based on the process parameters. |
