发明名称 SCANNING ELECTRON MICROSCOPE AND MICRO-PATTERN MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To establish stable measurement having no risk of being influenced by charge-up at all measuring points. SOLUTION: This electron microscope is composed of a power supply 21 for controlling the acceleration voltage, an electron gun 1 to emit an electron beam 1' at the acceleration voltage set by the power supply 21, an electron optical system to scan the surface of a sample 11 with the emitted electron beam 1', a retarding circuit 12 connected with the sample 11 and applying a retarding electric field to the part near the surface of the sample 11, a potentiometer probe 9 to measure the surface potential of the sample 11, and a feedback calculation circuit 30 to make a feedback to the power supply 21 on the basis of the obtained surface potential and the preset surface potential.
申请公布号 JP2001052642(A) 申请公布日期 2001.02.23
申请号 JP19990227547 申请日期 1999.08.11
申请人 TOSHIBA CORP 发明人 MIYANO YUMIKO;TOKAWA IWAO;KOMATSU BUNRO
分类号 H01J37/28;H01L21/027;(IPC1-7):H01J37/28 主分类号 H01J37/28
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