| 摘要 |
<p>PROBLEM TO BE SOLVED: To make it possible to decrease dimensional changes even if a photomask is used for long-time exposure without entailing trouble, such as upsizing of a developing device by sticking a transparent base material via a tacky adhesive layer to the opposite surface of a film formed with patterns for exposure on one surface of a film base. SOLUTION: The photosensitive film, such as a silver salt film, formed by laminating a photosensitive layer of a silver salt photosensitive emulsion, etc., on the one surface of the film base is used. The photosensitive film is printed with the patterns for exposure and is developed, by which the film formed with the patterns for exposure on the one surface of the film base is obtained. The transparent base material is stuck via the tacky adhesive layer to the surface opposite to the surface formed with the patterns for exposure of the film formed with the patterns for exposure on one surface of the film base. The transparent base material is stuck to the surface opposite to the surface formed with the patterns for exposure in the manner described above, by which the dimensional changes of the photomask by the repetitive exposure may be decreased.</p> |
