| 摘要 |
PROBLEM TO BE SOLVED: To reduce the relative misregistration between patterns by providing a low-layer pattern recognition mark on the pattern which is one layer below a layer on which a pattern is to be formed and reading the mark with a camera for position detection through the insulating resin of the layer on which the pattern is to be formed, and then, registering the mark with an exposure recognition mark. SOLUTION: In the formation of a build layer pattern, a lower-layer pattern recognition mark 7 is formed simultaneously with the pattern in the lower-layer recognition mark and exposure recognition mark indicating area 5 of a mask film for exposing the surface-layer pattern of a core layer. Then the mark 7 is recognized with a camera for position detection incorporated in an exposing device through the resin of a build layer and registered with the exposure recognition mark 8 of a mask film for forming the pattern of the build layer. When the mark 7 is formed in the above-mentioned way, the sticking deviation between a base material and a film can be controlled with high accuracy, because the mark 7 can be registered directly with a pattern or hole to be registered instead of a visually deformed reference hole. |
