发明名称 FORMATION METHOD FOR RESIST, WORKING METHOD FOR SUBSTRATE, AND FILTER STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a resist for satisfactory adhesion, a working method for a substrate, and a filter structure. SOLUTION: An aluminum film 72 is inserted between a glass substrate 71 and a resist 73, so that adhesion between them is enhanced because of the high adhesion of the aluminum film 72. Thus peeling of the resist 73 is prevented, while a base body is etched satisfactory with the resist 73 as a mask. This method can also be applied to a color filter structure.
申请公布号 JP2001052979(A) 申请公布日期 2001.02.23
申请号 JP19990222240 申请日期 1999.08.05
申请人 SONY CORP 发明人 HARA MASATERU
分类号 H01L21/302;C23F1/00;G03F7/075;G03F7/09;G03F7/105;G03F7/11;G03F7/38;G03F7/40;G03F7/42;H01L21/027;H01L21/3065 主分类号 H01L21/302
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