发明名称 MANUFACTURE OF PHOTOSENSOR WITH COLOR FILTER LENS
摘要 PROBLEM TO BE SOLVED: To reduce a flat thin film and a single protection layer and shorten the production cycle by forming a color filter lens on a part of a base and forming a conductor layer on the base and thereafter forming an insulation layer thereon. SOLUTION: A flat inner metallic dielectric layer is formed on a base (301) and a photosensitive region in exposed. A color filter lens layer is formed on an exposed photosensitive region of an inner metallic dielectric layer (302). A protection coating conductor is formed on the inner metallic dielectric layer (303), and after the protection coating conductor is made an upper metallic layer of a photosensor device, a single protecting layer as an insulation layer is formed and used for protection of a color filter lens and a metallic layer. Thereby, it is possible to reduce the flat thin film and a single protective layer, thus shortening the production cycle.
申请公布号 JP2001053296(A) 申请公布日期 2001.02.23
申请号 JP19990222060 申请日期 1999.08.05
申请人 UNITED MICROELECTRONICS CORP 发明人 RIN SHIGYO
分类号 H01L31/0232;(IPC1-7):H01L31/023 主分类号 H01L31/0232
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