| 摘要 |
PROBLEM TO BE SOLVED: To provide a negative chemically amplifable resist using electronic rays or X-rays satisfying requirements on sensitivity and resolution and resist form characteristics. SOLUTION: This chemically amplifiable negative resist composition contains an alkali-soluble resin, a radiation sensitive acid generator and a cross-linking agent to be allowed to cause cross-linking reaction by an acid and it is a phenol derivative having 3-5 benzene ring atomic groups and a molecular weight of <=1,200, and >=2 hydroxymethyl and/or alkoxy methyl groups in the molecule and is bonded to at least one benzene ring atomic group. |
