| 摘要 |
PROBLEM TO BE SOLVED: To provide an Al alloy electrode film and a sputtering target used for forming the same which has an excellent dry-etching property. SOLUTION: This electrode film is composed of a composition in which 1-5 atom % of at least one or more elements elected from B, C, 4a group, 5a group, 6a group, Fe, Co, Ni, Ru, Rh, Pd and Pt are contained in total, 100 weight ppm or less of Li, Na, K, Rb, Cs, Be, Mg, Ca, Sr and Ba are contained and the rest is Al. The pattern thereof is formed by dry etching. This electrode film is obtained by a sputtering target corresponding to the above composition.
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