GLASS SUBSTRATE, LAMINATED SUBSTRATE, AND PRODUCTION METHOD FOR GLASS SUBSTRATE

摘要

The present invention provides a glass substrate whereby alkali ions do not readily diffuse in a silicon substrate and little residual stress occurs in the silicon substrate, during a thermal treatment step in which the silicon substrate and the glass substrate are bonded together. This glass substrate has: an average thermal expansion coefficient α５０／１００ at 50-100°C of 2.70-3.20 ppm/°C; an average thermal expansion coefficient α２００／３００ at 200-300°C of 3.45-3.95 ppm/°C; a value α２００／３００／α５０／１００, being the average thermal expansion coefficient α２００／３００ at 200-300°C divided by the average thermal expansion coefficient α５０／１００ at 50-100°C, of 1.20-1.30; and an alkali metal oxide content, as expressed in mole percentage on an oxide basis, of 0%-0.1%.