发明名称 UNIFORM PAINT FILM SCATTERING SYSTEM BY MOVING SHOWER NOZZLE IN HORIZONTAL SPIN WASHING MACHINE
摘要 PROBLEM TO BE SOLVED: To instantaneously form a liquid film contributing to the reduction of the amount of the liquid and process time, and to make reaction of an entire substrate uniform by moving a movable shower nozzle toward the center of a substrate at appropriate speed while the liquid is scattered from the outside of the spinning substrate. SOLUTION: While liquid 1 is scattered, a shower nozzle 2 on a spinning substrate 5 is moved toward the center of the substrate 5, thus successively forming a liquid film from the outside of the substrate 5, and forming the uniform liquid film on the entire substrate 5 in an instant when the shower nozzle 2 reaches the center. A liquid supply port corresponds to the shower nozzle 2 for scattering the liquid with the area of a shower part rather than the nozzle diameter of the total area of a liquid scattering part small aperture, thus achieving superior efficiency. Furthermore, a supply amount of the liquid is set to merely primary supply on movement and secondary supply by replenishment on stop at the center, thus greatly reducing the amount of liquid to be used.
申请公布号 JP2001053045(A) 申请公布日期 2001.02.23
申请号 JP19990264288 申请日期 1999.08.12
申请人 SEFA TECHNOLOGY KK 发明人 KUSUNOKI DAISUKE
分类号 B08B3/02;B05B13/04;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B3/02
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