| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition excellent in developing solution resistance, sandblast resistance, handleability and shelf stability and useful also for a dry film resist by using a specified carboxyl-containing urethane resin, a photopolymerization initiator and an alkyl (meth)acrylate. SOLUTION: The photosensitive resin composition comprises a carboxyl- containing urethane resin, a photopolymerization initiator and an alkyl (meth) acrylate. The urethane resin is obtained by allowing a carboxyl-containing diol compound and a diol compound having an average molecular weight of <=500 and no acid value to react with a polyisocyanate compound, e.g. in a solvent in which the polyisocyanate compound is stable at a temperature below the boiling point of the solvent and allowing the resulting urethane compound to react with a compound having one or more ethylenically unsaturated groups and one hydroxyl group. |
