| 摘要 |
<p>PROBLEM TO BE SOLVED: To enable the exact regulation of an exposure without the load increase in terms of process management even for tabs of stringent specifications and the formation of wiring in compliance with design by forming a center mark having a portion of the same shape as the shape of a portion of a pattern and including at least two adjacent inner lead front end mask parts in this portion. SOLUTION: The inner lead front end mask parts which are the portion of the pattern have the same light shielding graphics as the light shielding graphics of the at least two adjacent portions existing side by side, i.e., the pattern partial duplicate graphics 2c, as part of the center mark. As a result, exposure and development may be executed with the same light shielding shape as the light shielding shape of the pattern portions where the two inner lead front end mask parts exist side by side when the exposure is regulated by using the center mark. Then, the adequate regulation of the exposure may be executed even for the tabs of the stringent specifications without the load increase in terms of process management and the formation of the wiring in compliance with the design is made possible.</p> |
