发明名称 SEMICONDUCTOR PRESSURE SENSOR AND FABRICATION THEREOF
摘要 PROBLEM TO BE SOLVED: To obtain a semiconductor pressure sensor, and a manufacturing method thereof, in which long term stability is enhanced significantly by eliminating respark to a reference pressure chamber. SOLUTION: The semiconductor pressure sensor measures pressure by detecting variation of capacitance between a diaphragm part 3 formed at a part of a silicon body 1 and an electrode film 4 formed on a glass substrate 2 bonded to the silicon body 1. Sealing performance is enhanced by removing protrusions of a bonding plane produced on an insulating layer 5 formed on a lead-out circuit 4a selectively thereby flattening the bonding face.
申请公布号 JP2001050841(A) 申请公布日期 2001.02.23
申请号 JP19990221715 申请日期 1999.08.04
申请人 FUJIKURA LTD 发明人 SATO MASAHIRO;NAKAO SATORU;KUROSAKA AKITO
分类号 G01L9/12;G01L9/00;H01L29/84;(IPC1-7):G01L9/12 主分类号 G01L9/12
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