发明名称 |
SEMICONDUCTOR PRESSURE SENSOR AND FABRICATION THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To obtain a semiconductor pressure sensor, and a manufacturing method thereof, in which long term stability is enhanced significantly by eliminating respark to a reference pressure chamber. SOLUTION: The semiconductor pressure sensor measures pressure by detecting variation of capacitance between a diaphragm part 3 formed at a part of a silicon body 1 and an electrode film 4 formed on a glass substrate 2 bonded to the silicon body 1. Sealing performance is enhanced by removing protrusions of a bonding plane produced on an insulating layer 5 formed on a lead-out circuit 4a selectively thereby flattening the bonding face.
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申请公布号 |
JP2001050841(A) |
申请公布日期 |
2001.02.23 |
申请号 |
JP19990221715 |
申请日期 |
1999.08.04 |
申请人 |
FUJIKURA LTD |
发明人 |
SATO MASAHIRO;NAKAO SATORU;KUROSAKA AKITO |
分类号 |
G01L9/12;G01L9/00;H01L29/84;(IPC1-7):G01L9/12 |
主分类号 |
G01L9/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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