PLASMA PROCESSING METHOD AND APPARATUS

摘要

PROBLEM TO BE SOLVED: To obtain a plasma processing method and apparatus which heats a location within a vacuum to be irradiated with high frequency microwave for plasma excitation without reducing the plasma density within the vacuum bath. SOLUTION: In the plasma processing apparatus, high frequency (13.5 MHz) microwave for plasma excitation is externally irradiated into a vacuum chamber 2 as a vacuum bath in which an object to be processed is placed and which is tightly closed, an irradiation means 5 is provided on a ceiling plate 4 as a location to be irradiated with high frequency (2450 MHz) microwave different in frequency from that of the first-mentioned frequency (13.56 MHz), and a dielectric member 6 for passing the high frequency (13.56 MHz) microwave therethrough and for absorbing the microwave (2450 MHz) is provided to the ceiling plate 4 of the vacuum chamber 2.