| 摘要 |
The present invention provides a linear evaporation deposition apparatus which is capable of performing uniform deposition on a large area substrate. The linear evaporation deposition apparatus includes: a conductive crucible unit extending in a first direction and disposed in a vacuum chamber, wherein the conductive crucible unit has a deposition material containing space for containing a deposition material of a powder type and heats the deposition material to generate vapor; a nozzle block formed in the vacuum chamber and having a parallelepiped shape having a predetermined length in the first direction, a predetermined height in a second direction perpendicular to the first direction, and a predetermined width in a third direction perpendicular to the first and second directions, wherein the nozzle block is installed in the conductive crucible unit and is formed of a conductive material; an induction heating coil disposed in the vacuum chamber to surround and inductively heat the nozzle block and the conductive crucible unit; and an AC power source for supplying AC power to the induction heating coil. The through-nozzles communicate with the deposition material containing space of the conductive crucible unit, are formed in the second direction, respectively, are parallel to each other while being spaced apart from each other in the first direction, and exhaust a vapor in the deposition material containing space. |
