发明名称 |
FORMATION OF BUMP ELECTRODE |
摘要 |
PROBLEM TO BE SOLVED: To obtain a method for forming bump electrodes in which the cost required for forming bump electrodes can be reduced by coating conductive pads formed on the surface of a semiconductor substrate with flux at low cost. SOLUTION: Conductive pads 2 formed on the surface of a wafer 1 is coated with soldering flux 3 by means of an ink jet unit 4. Since only required parts can be coated with flux 3 using the ink jet unit 4, only the conductive pads 2 can be coated with flux without requiring an expensive photomask or optical system.
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申请公布号 |
JP2001053099(A) |
申请公布日期 |
2001.02.23 |
申请号 |
JP19990222668 |
申请日期 |
1999.08.05 |
申请人 |
RICOH MICROELECTRONICS CO LTD |
发明人 |
KINOSHITA SHINGEN |
分类号 |
H05K3/34;H01L21/60;(IPC1-7):H01L21/60 |
主分类号 |
H05K3/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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