发明名称 FORMATION OF BUMP ELECTRODE
摘要 PROBLEM TO BE SOLVED: To obtain a method for forming bump electrodes in which the cost required for forming bump electrodes can be reduced by coating conductive pads formed on the surface of a semiconductor substrate with flux at low cost. SOLUTION: Conductive pads 2 formed on the surface of a wafer 1 is coated with soldering flux 3 by means of an ink jet unit 4. Since only required parts can be coated with flux 3 using the ink jet unit 4, only the conductive pads 2 can be coated with flux without requiring an expensive photomask or optical system.
申请公布号 JP2001053099(A) 申请公布日期 2001.02.23
申请号 JP19990222668 申请日期 1999.08.05
申请人 RICOH MICROELECTRONICS CO LTD 发明人 KINOSHITA SHINGEN
分类号 H05K3/34;H01L21/60;(IPC1-7):H01L21/60 主分类号 H05K3/34
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