| 摘要 |
PROBLEM TO BE SOLVED: To remove a by-product attaching to a main vacuum pump to reduce the particles attaching to a substrate without decreasing the operation efficiency in a method for cleaning a semiconductor manufacturing equipment. SOLUTION: When cleaning a CVD system 1, first rotation of a turbo molecular pump 25 is stopped with a gate bulb 24 closed. Next, the gate bulb 24 is opened and a processing chamber 2 is evacuated with a dry pump 28 through the turbo molecular pump 25. Then, Ar gas is supplied into a reactor cavity 18 from a gas source 11c, and microwaves are applied to the Ar gas by a microwave generator 19 to generate a plasma. Successively, an NF3 gas is supplied into the reactor cavity 18 from a gas source 11d to be converted into radicals. By sending fluorine radicals F* to the processing chamber 2, the system is cleaned.
|
