发明名称 METHOD AND APPARATUS FOR X-RAY FLUORESCENCE ANALYSIS
摘要 PROBLEM TO BE SOLVED: To obtain a method and an apparatus for an X-ray fluorescence analysis, in which the intensity of fluorescent X-rays generated from an element to be measured in a sample is calculated, by a method where an overlap due to the spectrum of an interfering line is corrected, in order to remove a part in which the spectrum of the intensity line is overlapped by using a correction which can obtain a precise analytical value regaring the element to be measured in the sample. SOLUTION: When a spectrum overlap due to the spectrum S2 of an interfering line is corrected, an intensity Ijc in which the overlapped part e21 of the spectrum S1 of an element to be measured is removed from the measuring intensity Ij of the interfering line is used. In order to correct the spectrum overlap due to the spectrum of the interfering line, rather than the measuring intensity Ij of the interfering line, the intensity Ijc, in which the overlapped part by the spectrum of the element to be measured is removed from the measuring intensity Ij of the interfering line, is used. As a result, the precise intensity of fluorescent X-rays generated from the element to be measured can be calculated, and the accurate measurement of the element can be made.
申请公布号 JP2001050918(A) 申请公布日期 2001.02.23
申请号 JP19990225072 申请日期 1999.08.09
申请人 RIGAKU INDUSTRIAL CO 发明人 KATAOKA YOSHIYUKI;INOUE MINORU;MATSUO TAKASHI
分类号 G01N23/223;(IPC1-7):G01N23/223 主分类号 G01N23/223
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