| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma generating device and a plasma processing device capable of generating plasma capable of enhancing the in-plane uniformity of the processing of a processed object. SOLUTION: An antenna 3 made up of a plurality of antenna pieces 3a concentrically disposed in one plane and different in diameter from each other, a high-frequency power supply 1 for antenna for supplying high-frequency power to the antenna 3, and a vacuum container 7 for introducing thereinto a process gas G to be turned into plasma by using the antenna 3 are provided. Electric currents opposite directed to each other flow through antenna pieces 3a radially neighboring each other of the antenna 3. An annular and magnetically neutral region is formed within the vacuum container 7 by an induction field caused by the antenna 3. The plasma generated within the vacuum container 7 is diffused toward the magnetically neutral region, thus forming the plasma into an annular shape within the vacuum container 7. |
