| 摘要 |
PROBLEM TO BE SOLVED: To obtain a substrate developing apparatus and a method therefor, which prevent minute deposits from remaining of on the substrate, in particular on open frame and in a pattern-formed region, after the developing process. SOLUTION: After a substrate W, to which a developing solution has been supplied by a developing solution supply part 50, is subjected to a first rinsing process with a rinsing solution supply part (60), the surface of the substrate W is entirely heated by supplying heated nitrogen gas to the main surface of the substrate W from a heated gas supply part 80. After that, a second rinsing solution supply process is carried out again by the rinsing solution supply unit (60). By the heating process, deposits that are adhered on the substrate W after the supply of the developing solution are dried, and are easily washed out from the substrate by the second rinsing process, which is carried out for the substrate W immediately after the heating process. As a result, remaining of deposits on the substrate after the developing process can be effectively prevented. |
