发明名称 PHOTOSENSITIVE COMPOSITION BASED ON SAPONIFIED PRODUCT OF POLYVINYL ACETATE AND PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To obtain a photosensitive composition soluble in a high boiling point organic solvent such as propylene glycol, developable with water, excellent in safety and having high sensitivity, high adhesiveness to a substrate and good suitability to patterning by dissolving a derivative of a saponified product of polyvinyl acetate having specified constituent units in at least one organic solvent selected from a specified group. SOLUTION: A derivative of a saponified product of polyvinyl acetate having constituent units of formulae I, II, etc., is dissolved in at least one organic solvent selected from the group comprising solvents of formulae III, IV, etc., to obtain the objective photosensitive composition. In the formulae I-IV, (k) and (l) are each an arbitrary natural number, (l) may be 0, R1 is H or methyl, R5 and R6 are each H, methyl, ethyl or acetyl, R7 and R8 are each H, methyl or ethyl, (s) is an integer of 1-4 and (t) is an integer of 1-2.
申请公布号 JP2001051416(A) 申请公布日期 2001.02.23
申请号 JP20000162580 申请日期 2000.05.31
申请人 TOYO GOSEI KOGYO KK 发明人 TAKANO KAZUHIRO;UTSUNOMIYA SHIN;SAKAI NOBUSHI;TOCHISAWA TETSUAKI
分类号 G03F7/038;C08F2/50;C08F218/08;G03F7/004;G03F7/16 主分类号 G03F7/038
代理机构 代理人
主权项
地址