| 摘要 |
PROBLEM TO BE SOLVED: To obtain a periphery exposing apparatus capable of applying to peripheral region of a photosensitive substrate at least a specified value of exposure without lowering the throughput. SOLUTION: On a photosensitive substrate G, a patterned region 5a where a pattern is exposed and a non-patterned region 5b where no pattern is exposed are prescribed. The non-patterned region 5b has at least two peripheral regions 51, 52 that are divided according to the thickness of the photosensitizing agent coated on the photosensitized substrate G. For the peripheral region 52 where the photosensitized agent is coated thick, a transfer mechanism is moved at 100 mm/sec, while for the peripheral region 51 to while the photosensitizing agent is applied thinly, the transfer mechanism is moved at 200 mm/sec. The exposure in the peripheral region 52 is larger than that in the peripheral region 51, and a specified exposure is given to the photosensitizing agent. Consequently, peeling off of the photosensitizing agent in a subsequent process becomes easy.
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