| 摘要 |
<p>A film forming device which comprises an evacuatable treating vessel, a mount disposed in the treating vessel and adapted to have a treatment-object material placed thereon, a treating gas feeding means for feeding a treating gas into the treating vessel, and a heating means for heating the treatment-object material placed on the mount. The lateral and lower sides of the mount are surrounded by a partition wall. The region associated with the mount surrounded by the partition wall has an inert gas introduced thereinto by an inert gas feeding means. A clearance defining member is so disposed that its inner peripheral side defines a clearance above the peripheral edge of the treatment-object material placed on the mount and its outer peripheral side defines a clearance above the partition wall.</p> |
