发明名称 VARIABLE ANGLE ILLUMINATION WAFER INSPECTION SYSTEM
摘要 <p>A variable illumination angle inspection system is provided, including a light source providing a light beam and a scanner imparting scanning deflection to the light beam to provide a scanning beam approaching a substrate at a first angle. A deflection element is selectively insertable into an optical path of the scanning beam to deflect the scanning beam so as to cause the scanning beam to approach the substrate at a second angle.</p>
申请公布号 WO2001013098(A1) 申请公布日期 2001.02.22
申请号 US2000022410 申请日期 2000.08.16
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