ARRANGEMENT ENABLING A LIQUID TO FLOW EVENLY AROUND A SURFACE OF A SAMPLE AND USE OF SAID ARRANGEMENT
摘要
The invention relates to an arrangement enabling a liquid (2) to flow evenly around a surface of a sample (3). Said arrangement has a flow chamber (1) through which a liquid (2) flows via inlet and outlet pipes (7, 8). The sample (3) can be rotated about an axis of rotation by means of a rotary drive (5). A filter (13) which extends crosswise to the direction of flow of the liquid (2) and which ensures that said liquid flows evenly through the inlet and outlet pipes (7, 8) is situated in front of said inlet and outlet pipes (7, 8). The inventive arrangement is especially suitable for precipitating a homogenous layer of a nickel/iron alloy on a silicon wafer (3). The invention also relates to the use of the inventive arrangement.
申请公布号
WO0112882(A1)
申请公布日期
2001.02.22
申请号
WO2000DE02704
申请日期
2000.08.10
申请人
TYCO ELECTRONICS LOGISTICS AG;HOSTEN, DANIEL;SCHMIDT, HELGE;SCHWAB, MICHAEL