METHOD FOR REDUCING THE AMOUNT OF PERFLUOROCOMPOUND GAS CONTAINED IN EXHAUST EMISSIONS FROM PLASMA PROCESSING

摘要

In a method for treating perfluorocompound gas contained in exhaust emissions from plasma processing a plasma abatement device (106) is first provided downstream of a plasma processing chamber (102). Next, perfluorocompound gas contained in exhaust emissions from the plasma processing chamber (102) is channeled into the plasma abatement device (106). A gas containing water vapor is then introduced into the plasma abatement device (106). In a method for reducing the amount of perfluorocompound gas contained in exhaust emissions from plasma processing exhaust emissions from plasma processing containing a perfluorocompound gas are contacted with a gas containing water vapor. The exhaust emissions from plasma processing containing the perfluorocompound gas may be contacted with the gas containing water vapor in either a plasma abatement device (106) provided downstream of a plasma processing chamber or directly in the plasma processing chamber (102). A method for forming an integrated circuit also is described.