| 摘要 |
<p>A light-transmitting film which comprises 0.01 to 20 wt % of at least one glass-forming oxide selected from the group consisting of Nb2O5, V2O5, B2O3, SiO2 and P2O5, 0.01 to 20 wt % of at least one member selected from the group consisting Al2O3 and Ga2O3, and optionally 0.01 to 5 wt % of at least one hard material oxide selected from the group consisting ZrO2 and TiO2, the remainder of the film being constituted of at least one oxide selected from the group consisting of In2O3, SnO2 and ZnO, and a sputtering target for use in forming the film. The film and the sputtering target according to the invention can be used for reducing particles being formed during sputtering and reducing the number of the stop of sputtering operation, which results in increasing productivity, and also for producing a protecting film for an optical disk which has a high transmittance and a low reflectance.</p> |
