| 摘要 |
The present invention provides a pattern forming process. The process comprises the following steps.(1) A photosensitive material is prepared by coating a photosensitive composition onto the surface of a substrate. The photosensitive composition comprises the following components:(a) an acid generator which generates an acid when irradiated with actinic radiation, and(b) a compound containing carboxyl groups, which can decompose upon decarboxylation.(2) The photosensitive material is subjected to pattern-wise exposure to actinic radiation, thereby allowing the acid generator (a) to generate an acid in the exposed area.(3) The acid generated in the exposed area is neutralized with a basic compound (c).(4) The carboxyl groups in the carboxyl-group-containing compound (b) in the unexposed area are decarboxylated by applying conditions under which the basic compound (c) can catalyze decarboxylation.(5) The photosensitive material, and composition used in the above process are developed. The basic compound (c) can be introduced in advance into the photosensitive material prepared in step (1). By using such a pattern forming process or a photosensitive composition, a pattern can successfully be formed with high reproducibility without being affected by the environment.
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