| 摘要 |
A technique for ion beam sputter deposition of optical coatings. The technique includes the following features (i) an assist chemical emitted towards the sputter target to oppose the tendency of film growth on the target; (ii) a discriminate baffle to capture ions or assist chemicals reflected from the target; (iii) a screen chemical to protect the coating area from the assist chemical; (iv) compartmentalized of the coating chamber to reduce crossing effects between the different chemicals (D.W.) (C.L.); (v) a compartmentalized assist ion beam to modify the coating and to reduce microstructure, defects and impurities in the coating (D.W.) (C.L.); and (vi) to combine the above features or multiply use one of the above features to further advantage or to increase throughput.
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