发明名称 Plasma reactor having a helicon wave high density plasma source
摘要 A helicon wave, high density RF plasma reactor having improved plasma and contaminant control. The reactor contains a well defined anode electrode that is heated above a polymer condensation temperature to ensure that deposits of material that would otherwise alter the ground plane characteristics do not form on the anode. The reactor also contains a magnetic bucket for axially confining the plasma in the chamber using a plurality of vertically oriented magnetic strips or horizontally oriented magnetic toroids that circumscribe the chamber. The reactor may utilize a temperature control system to maintain a constant temperature on the surface of the chamber.
申请公布号 US6189484(B1) 申请公布日期 2001.02.20
申请号 US19990263642 申请日期 1999.03.05
申请人 APPLIED MATERIALS INC. 发明人 YIN GERALD ZHEYAO;LEE CHII GUANG;KHOLODENKO ARNOLD;LOEWENHARDT PETER K.;SHAN HONGCHING;MA DIANA XIAOBING;KATZ DAN
分类号 C23C16/00;H01J37/32;H05H;H05H1/00;H05H1/24;(IPC1-7):C23C16/00 主分类号 C23C16/00
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