发明名称 Radiation-setting composition containing (meth)acrylic copolymers containing acid groups
摘要 Radiation-setting compositions suitable for the formation of LCD spacers or protective layers which are excellent in photosetting properties (requiring no heat-setting) and development properties, have high adhesiveness to substrates and excellent mechanical characteristics, remain stable over a long storage time and show excellent working condition-dependency.Such a radiation-setting composition for the formation of LCD spacers or protective layers comprises a (meth)acrylic acid-based copolymer having an acid value of 30 to 200 and a glass transition temperature of -30 to 180° C., a (meth)acrylate-based compound obtained by copolymerizing a monomer having a specific structure with a monomer at least having an acidic group, a radiation-sensitive compound and a solvent.
申请公布号 US6191184(B1) 申请公布日期 2001.02.20
申请号 US19990303568 申请日期 1999.05.03
申请人 FUJI PHOTO FILM CO., LTD.;FUJIFILM OLIN CO., LTD. CO., LTD. 发明人 SUZUKI NOBUO;OKITA TSUTOMU;MASAKI YOSHIHISA
分类号 G02F1/1339;C08F2/48;C08F2/50;C08F220/40;C08F265/06;C08L33/00;G02F1/1333;(IPC1-7):C08F2/50;C08L33/08;C08L33/10;C08J3/28 主分类号 G02F1/1339
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