发明名称 |
Radiation-setting composition containing (meth)acrylic copolymers containing acid groups |
摘要 |
Radiation-setting compositions suitable for the formation of LCD spacers or protective layers which are excellent in photosetting properties (requiring no heat-setting) and development properties, have high adhesiveness to substrates and excellent mechanical characteristics, remain stable over a long storage time and show excellent working condition-dependency.Such a radiation-setting composition for the formation of LCD spacers or protective layers comprises a (meth)acrylic acid-based copolymer having an acid value of 30 to 200 and a glass transition temperature of -30 to 180° C., a (meth)acrylate-based compound obtained by copolymerizing a monomer having a specific structure with a monomer at least having an acidic group, a radiation-sensitive compound and a solvent.
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申请公布号 |
US6191184(B1) |
申请公布日期 |
2001.02.20 |
申请号 |
US19990303568 |
申请日期 |
1999.05.03 |
申请人 |
FUJI PHOTO FILM CO., LTD.;FUJIFILM OLIN CO., LTD. CO., LTD. |
发明人 |
SUZUKI NOBUO;OKITA TSUTOMU;MASAKI YOSHIHISA |
分类号 |
G02F1/1339;C08F2/48;C08F2/50;C08F220/40;C08F265/06;C08L33/00;G02F1/1333;(IPC1-7):C08F2/50;C08L33/08;C08L33/10;C08J3/28 |
主分类号 |
G02F1/1339 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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