发明名称 Exposure device, method of making and using same, and objects exposed by the exposure device
摘要 Even when a surface temperature of an illumination optical system becomes high, detection accuracy of a reticle alignment detection system is not negatively affected. An illumination optical system irradiates an illumination light to a mask and exposes a substrate with the illumination light through the mask. A gas supply device supplies gas, which has been cleaned, to a case in which is disposed at least part of an illumination optical system. A temperature adjusting device adjusts the temperature of the case and the temperature in the vicinity of the case.
申请公布号 US6191843(B1) 申请公布日期 2001.02.20
申请号 US19990389083 申请日期 1999.09.02
申请人 NIKON CORPORATION 发明人 TAKIGUCHI MASAO
分类号 H01L21/027;G03F7/20;G03F9/00;(IPC1-7):G03B27/52;G03B27/42;G02B21/36;G01B11/00;G03G15/00 主分类号 H01L21/027
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